Electrochemical Removal of CuII in the Presence of Humic Acid

نویسندگان

  • Claudomiro P. Barbosa
  • Geoffroy R. P. Malpass
  • Douglas W. Miwa
  • Luciano Gomes
  • Rodnei Bertazzoli
  • Artur J. Motheo
چکیده

A remoção de Cu (10 mg L) complexado por ácido húmico comercial (100 mg L) foi estudada a diferentes densidades de corrente (30-80 mA cm) usando uma célula filtro-prensa, ânodo de Ti/Ru 0.3 Ti 0.7 O 2 e cátodo de aço inoxidável. As eletrólises foram feitas com e sem membrana separando os compartimentos da célula [aniônica homogênea (Nafion R117), catiônica heterogênea (Ionac MC-3470) e aniônica heterogênea (Ionac MA-3475)]. A influência da membrana na velocidade de remoção de Cu foi maior com as catiônicas. Foi obtida eficiência de corrente de ca. 55% (Ionac MC-3470) para remoção de Cu a 30 mA cm. Combinando oxidação e redução, foi obtida remoção de 100% de Cu com eficiência de corrente de 75%. A etapa principal para a remoção é interação eletrostática com o ânodo, seguida pela difusão através da membrana e deposição sobre o cátodo. Adicionalmente, a degradação oxidativa de ácido húmico contribui com a velocidade de remoção de Cu.

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تاریخ انتشار 2010